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翻訳と辞書　辞書検索 [ 開発暫定版 ] スポンサード リンク Solution precursor plasma spray ： ウィキペディア英語版 Solution precursor plasma spray Solution Precursor Plasma Spray (SPPS) is a thermal spray process where a feedstock solution is heated and then deposited onto a substrate. Basic properties of the process are fundamentally similar to other plasma spraying processes. However, instead of injecting a powder into the plasma plume, a liquid precursor is used. The benefits of utilizing the SPPS process include: the ability to create unique nanometer sized microstructures without the injection feed problems normally associated with powder systems and flexible, rapid exploration of novel precursor compositions.〔Eric H. Jordan, L. Xie, C. Ma M. Gell, N. Padture, B. Cetegen, J. Roth, T. D. Xiao and P. E. C. Bryant, "Superior Thermal Barrier Coatings Using Solution Precursor Plasma Spray", ''Journal of Thermal Spray'', 13(1), 2004, p 57-65〕〔L. Xie, X. Ma, E.H. Jordan, N. P. Padture, T.D. Xiao and M. Gell, "Deposition of Thermal Barrier Coatings Using Solution Precursor Plasma Spray Process", ''Journal of Material Science'', 39, 2004 p1639-1636〕 == Background == The use of a solution precursor was first reported as a coating technology by Karthikeyan, et al.〔Karthikeyan J.,Berndt C.C., Tikkanen J., Wang J.Y., King A.H., Herman H, "Preparation of Nanophase Materials by Thermal Spray Processing of Liquid Precursors", ''Nanostructured Materials'', 9(1), 1997, p 137-140〕〔Karthikeyan J.,Berndt C.C., Tikkanen J., Wang J.Y., King A.H., Herman H, "Nanomaterial Powders and Deposits Prepared by Flame Spray Processing of Liquid Precursors", 8(1), 1997, p 61-74〕〔Jeganathan Karthikeyan, Christopher C. Berndt, Sri Reddy, Jenn-Yue Wang, Alexander H. King, and Herbert Herman, "Nanomaterial Deposits Formed by DC Plasma Spraying of Liquid Feedstocks", ''Journal of the American Ceramic Society'', 81, 1998, p 121-128〕 In that work, Karthikeyan showed that the use of a solution precursor was in fact feasible, however, well adhered coatings could not be generated. Further work was reported in 2001 which refined the process to produce thermal barrier coatings,〔N. P. Padture, K. W. Schlichting, T. Bhatia, A. Ozturk, B. Cetegen, E. H. Jordan, M. Gell, S. Jiang, T. D. Xiao, P. R. Strutt, E. Garcia , P.Miranzo and M. I. Osendi, "Towards Durable Thermal Barrier Coatings with Novel Microstructures Deposited by Solution Precursor Plasma Spray", ''Acta Materialia'', 49, 2001, p 2251–2257〕 YAG films,〔Sujatha D. Parukuttyamma, Joshua Margolis, Haiming Liu, Clare P. Grey, Sanjay Sampath, Herbert Herman, and John B. Parise, "Yttrium Aluminum Garnet (YAG) Films through a Precursor Plasma Spraying Technique", ''Journal of the American Ceramic Society'', 84(8), 2001, p 1906–908〕 and silicon ceramic coatings.〔E. Bouyer, G. Schiller, M. Muller, and R. H. Heane, "Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors", ''Plasma Chemistry and Plasma Processing'', 21(4), 2001, p 523-546〕 Since then, extensive research on the technology has been explored in large part by the (University of Connecticut ) and (Inframat Corporation ). 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Solution precursor plasma spray」の詳細全文を読む スポンサード リンク 翻訳と辞書 : 翻訳のためのインターネットリソース Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.